AURION Anlagentechnik GmbH
Plasma technology = Plasma systems + RF-Components
AURION Anlagentechnik GmbH was founded in 1996 by three shareholders. Our goal is do develop and manufacture technology-leading components and complete systems for surface treatment. Our team of 16 highly qualified engineers and technicians loves the challenges.
Efficiency, cost reduction and environmentally friendly, technology leading solutions are the characteristics that our customers in research and industry appreciate at AURION.
At the Seligenstadt site east of Frankfurt am Main and located directly on autobahn A3, we can be easily reached by plane, train or car.
Business Division Plasma systems
Based on the know-how from manufacturing components for plasma processes AURION offers complete systems for plasma assisted surface treatment, that means for surface cleaning and surface modification as well as coating and etching (PVD, PECVD, RIE, Microwave).
Based on our very flexible modular concept for plasma systems we offer each customer a tailor made solution for his specific demands.
Applications are for example fine cleaning of metal or glass and pretreatment of polymer surfaces in order to improve the adherence. Furthermore our systems are used in the semiconductor, medical and microsystem technology, where they can be used for coating and reactive ion etching.
Business Division RF Components
AURION develops and manufactures components for the power supply of plasma systems such as impedance matching networks with automatic tuning, filters, switches, phase shifters, power splitters, lines and connectors. The activities in this field are mainly focused on RF plasma processes with 13.56 and 27.12 MHz.
Our components are specific individual high quality solutions, just as required by our customers. For that reason we are actually delivering key components to large equipment manufacturers.
Business Division Services
Because of our employees' great experience in these fields AURION also offers consulting services and training courses in plasma- and RF-technology.