Thinking Ahead

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RIE Systems

Plasma Systems for Reactive Ion Etching, wide variety of chamber layouts available.

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PECVD Systems

Plasma Systems for the deposition of thin films from the gas phase.

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PVD Systems

Plasma Systems for the deposition of thin films by means of sputtering processes.

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Atmospheric Pressure Plasma Sources

Unique Integration of electrical supply and plasma generation.

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Cluster Systems

Multi chamber plasma systems with substrate handling (PVD, RIE, PECVD).

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DIN EN 9001

Aurion is certified for DIN EN 9001:2008.

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Plasma Systems

Atmospheric pressure plasma sources, RIE, microwave downstream plasma, PVD (Sputtering) and PECVD systems as well as combinations thereof, including cluster tools.

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Components

Radio frequency components like Automatic Impedance Matching Networks (Matchboxes), Switches, Filters, Power Splitters, Phase Shifters etc.

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Updates

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Services

Aurion´s team offers its extensive expertise in the areas of plasma technology and radio frequency technology for consulting services and training classes.

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Callback Service

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We will call you as soon as possible.

Contact

Aurion Anlagentechnik GmbH

Am Sandborn 14
63500 Seligenstadt

Tel. +49(0) 6182 96 28 -0
Fax. +49(0) 6182 96 28 -16

We are Members of

EFDS Plasma Germany Nano in Germany

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