Plasma Systems for Reactive Ion Etching, wide variety of chamber layouts available.
Plasma Systems for the deposition of thin films from the gas phase.
Plasma Systems for the deposition of thin films by means of sputtering processes.
Atmospheric Pressure Plasma Sources
Unique Integration of electrical supply and plasma generation.
Multi chamber plasma systems with substrate handling (PVD, RIE, PECVD).
DIN EN 9001
Aurion is certified for DIN EN 9001:2008.